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SEMI F61 — Guide for Ultrapure Water System Used in Semiconductor Processing
for the deposition of titanium nitride layers by atomic layer deposition or chemical vapor deposition
Using polystyrene latex spheres (PSL) as a filter challenge does not work at the 5 to 15 m size range because the PSL size distribution is too broad and using white spherical plastic beads is an unrealistic challenge for filter testing
SEMI C21-0618 (technical revision)
This edition was approved for publication by the global Audits & Reviews Subcommittee on December 20
C00312 - SEMI C3.12 - Specification for Ammonia (NH3) in Cylinders, 99.998% Quality StdPbc-0713 SEMI F61 — Guide forThe purpose of this Standard is to provide specification for ammonia (NH3) that is used in the semiconductor industry. This Standard covers requirements for ammonia used in the semiconductor industry. Referenced SEMI Standards (purchase separately) SEMI C3 Specification for Gases Revision History SEMI C3. 12 0116 (Reapproved 0922) SEMI C3. 12 0116 (technical revision) SEMI C3. 12 1109 (technical revision) SEMI C3. 12 1102 (technical revision) SEMI C3.